These high-vacuum systems are used to measure the elemental and/or chemical properties of the top few nanometers of a sample. Each of them analyzes particles ejected from a sample by energy or mass to uncover details about the material’s composition. Each is equipped with an integrated sputter gun for depth profiles to analyze elemental variation deeper into the material.
IONTOF ToF-SIMS
The IONTOF 5-300 Time-of-Flight SIMS system uses a beam of ions to remove sub-monolayer amounts of material from a sample in vacuum. Some of those sputtered atoms become ionized in the process and are collected by electronic lenses.
Thermo K-alpha XPS
The Thermo K-Alpha XPS uses a focused beam of x-rays to eject electrons from the near-surface region of a sample in a vacuum.