CMOS Cleaning Station

CMOS Cleaning Station

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The CMOS Cleaning Station is a dedicated wet bench equipped with heated tanks for standard wafer cleaning processes, including Piranha, SC-1, SC-2, and dilute HF etching. This fume hood is reserved for CMOS-qualified processes with pre-approved process flows. Only 4-inch and 6-inch wafers are permitted, ensuring compatibility with contamination-sensitive fabrication requirements.

CMOS Cleaning Station (Marcus)

CMOS Piranha Station (Pettit)

Solvent Fume Hood

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The Solvent Fume Hoods are designated workstations designed for safe handling of volatile organic solvents commonly used in microfabrication processes. These hoods provide proper ventilation and chemical resistance for tasks such as photoresist coating and development, wafer cleaning, lift-off processes, and other solvent-based procedures. Each hood is equipped with solvent waste collection and is maintained to ensure user safety and contamination control.

Fume Hoods

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The Acid/Base Fume Hoods are designed for safe handling of corrosive chemicals used in microfabrication, including strong acids and bases. These hoods support processes such as wet etching, oxide removal, and substrate cleaning. Each station is equipped with chemical-resistant surfaces, proper ventilation, and waste collection systems to ensure safe operation and minimize cross-contamination.

Plating Station

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The Plating Station is equipped with four independent power supplies to support electroplating of metals such as nickel, copper, and gold. Designed for uniform metal deposition on wafers and substrates, this station enables precise control of current and plating parameters. It is suitable for applications in MEMS, microelectronics, and packaging processes, and is available only to trained users with approved process flows.

PV Clean Bench

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The PV Clean Bench is a dedicated wet chemical hood designed for silicon etching and processing of photovoltaic wafers. It supports specialized etch chemistries used in solar cell fabrication and silicon surface texturing. The bench ensures safe handling of chemicals and contamination control for high-purity applications.