From Data to Device: Advanced Electron Beam Lithography
Join the Institute for Matter and Systems for an afternoon seminar exploring advanced electron beam lithography techniques and their applications in space science, semiconductor processing, photonics, and nanoscale device fabrication. Speakers from academia and industry will discuss the lithography workflow, from pattern preparation and equipment considerations to process optimization and finished devices.
Date: Wednesday, Oct. 21, 2026
Time: 1:30–4:45 p.m.
Location: Marcus Nanotechnology Building, Conference Rooms 1116–1118
Format: In person and online
Program
- 1:30 p.m. | Electron Beam Lithography Fabricated Gratings for Space Applications | Fabien Grisé, Penn State University
- Fabien Grisé will discuss the use of electron beam lithography to fabricate diffraction gratings for future space telescopes. The presentation will address nanoscale patterning, large-area writing, stitching control, resist and dose optimization, and fabrication considerations for X-ray, extreme-ultraviolet, and far-ultraviolet applications.
- 2:15 p.m. | Electron Beam Lithography from Elionix’s Perspective | Lukas Stampfer, STS-Elionix
- Lukas Stampfer will provide a vendor’s perspective on the inner workings of electron beam lithography systems, the technical trade-offs involved in their development, and strategies for addressing equipment-related effects that can influence exposure results.
- 3 p.m. | Coffee Break
- 3:15 p.m. | Advanced Data Preparation and Techniques for Optimized Patterning | Kaustubh Vyas, GenISys GmbH
- Kaustubh Vyas will examine the data preparation steps that help translate a design file into a successfully fabricated structure. Topics will include machine-specific fracturing, shot placement, writing order, field control, proximity-effect correction, simulation, and scanning electron microscopy-based metrology.
- 4 p.m. | Electron-Beam Lithography for Photonic Device Fabrication: Applications and Practical Considerations | Ashkan Zandi, Georgia Institute of Technology
- Ashkan Zandi will discuss the development and practical implementation of electron beam lithography processes for integrated optics, metaphotonic devices, and grayscale-fabricated three-dimensional structures. The presentation will highlight resist selection, exposure-dose optimization, proximity effects, pattern fidelity, development conditions, reproducibility, and fabrication yield.
- 4:45 p.m. | Adjourn
About the Speakers
Fabien Grisé is an associate research professor in the Department of Astronomy and Astrophysics at Penn State University. His research focuses on diffraction-grating technology for future NASA space telescopes, including electron beam lithography fabrication for X-ray, extreme-ultraviolet, and far-ultraviolet gratings.
Lukas Stampfer has served as an application engineer for European and North American customers at STS-Elionix since 2021. He earned a doctorate in quantum transport from the University of Copenhagen and a master’s degree in condensed matter physics from the Technical University of Munich.
Kaustubh Vyas works across applications engineering, product improvement, and technical sales at GenISys. His background includes III-V and silicon photonics, and his current work focuses on lithography data preparation, predictive simulation, and process improvement.
Ashkan Zandi is a research faculty member in the School of Electrical and Computer Engineering at the Georgia Institute of Technology. His research spans nanofabrication, integrated photonics, metaphotonics, biosensors, quantum sensing, and biomedical engineering.
Sponsors
This seminar is sponsored by STS-Elionix and GenISys GmbH.