Optec WS Flex Femtosecond Laser
The Optec#1 laser is an OPTEC WS-Flex USP system that uses a femtosecond laser to process practically any material through ultra-short laser pulses photo-ablation as well as the wire/tubing ablation on Rotary Stage. The ultra-short laser pulse is effective on polymers, metal, ceramics, glass, single crystals, and polymorphic crystals. Materials are ionized by the laser pulse and removed from the surface in a plasma cloud, leaving a clean surface at the interaction site. Contrary to typical thermal laser operations, the femtosecond laser is not as sensitive to wavelength absorption and therefore offers minimum thermal, creating a no heat-affected zone on the part.
Optec LSV Flex Femtosecond Laser
The Optec#2 laser is an OPTEC LSV-Flex USP system with Three-axis motion platform that uses a femtosecond laser to process practically any material through ultra-short laser pulses photo-ablation. The ultra-short laser pulse is effective on polymers, metal, ceramics, glass, single crystals, and polymorphic crystals. Materials are ionized by the laser pulse and removed from the surface in a plasma cloud, leaving a clean surface at the interaction site. Contrary to typical thermal laser operations, the femtosecond laser is not as sensitive to wavelength absorption and therefore offers minimum thermal, creating a no heat-affected zone on the part.
Alabama UV Laser
The Alabama UV laser is an Ultrafast pulsed laser designed to work on silicon wafers for the photovoltaic industry. It applies the Coherent AVIA series Q-switched 355 nm DPSS Laser. AVIA NX is ideal for applications such as via drilling in PCB and Flex materials,3D chip package manufacturing, IC package trimming, and wafer scribing. The AVIA NX offers effortless ease of integration into laser-based tools through its small footprint and simplified interface.
SCS Parylene Coater
The Georgia Tech SCS Labcoater PDS 2010 is a vacuum system used for conformal vapor deposition of Parylene at room temperature. Typical deposition thicknesses range from 1um to 50um. Parylene-Cand Parylene-N dimers are provided. Typical deposition thickness range: many sources say from ~1 µm up to tens of µm (for example your note said 1 µm to 50 µm) and other references say up to ~75 µmor even higher. Vacuum chamber & capacity specs: chamber size ~12″ × 12″ capacity for one variant; Power / dimer capacity / vacuum pump info: Dimer capacity: Up to ~0.38 lbs (~125 g) in one variant. Processing conditions: vacuum deposition is done at moderate vacuum levels rather than ultra-high vacuum.